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Department of Electrical Engineering

Department of Electrical Engineering. Dr. R. J. Soukup.

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Department of Electrical Engineering

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  1. Department of Electrical Engineering

  2. Dr. R. J. Soukup Omar Heins Professor EmeritusDepartment of Electrical Engineering246N SECUniversity of Nebraska-LincolnLincoln, NE 68588-0511Voice: (402)472-1980FAX: (402)472-4732rsoukup@unl.eduhttp://engineering.unl.edu/academicunits/electrical engineering/faculty-staff/soukup.shtml

  3. Where are we? Chicago Nebraska Population: 1,826,341 Lincoln Population: 258,379 (2010 Census)

  4. Cities and Towns of Interest • Lincoln – State capitol, location of the flagship (original) University of Nebraska campus. • Omaha – Largest city in Nebraska, 2010 census population of 427,872. • Prague – Located about 50 km north of Lincoln, near Czechland Lake Recreation and Wildlife Management Area. • Wilber – Located about 40 km southwest of Lincoln. It is the home of the annual Czech Festival each summer.

  5. People who performed research at the University of Nebraska • ZdeněkHubička: Postdoctoral Research Associate, 11 January, 1999 through 5 April 2000 and Assistant Research Professor, 15 September 2002 through 16 December 2002. Currently Head of the Department of Low Temperature Physics, Division of Optics, Institute of Physics of the Academy of Sciences of the Czech Republic. • ŠtěpánKment: Postdoctoral Research Associate, 1 May 2010 through 30 November 2010. Currently Postdoctoral Fellow in the same Department, but in Praha and Olomouc. • Jiří Olejníček: Several six month periods at the University of Nebraska at Kearney. Currently an Associated Scientist in the same Department. • HanaKmentova: Postdoctoral Research Associate, 1 May 2010 through 30 November 2010. Currently a mother at home.

  6. Wind

  7. SUN

  8. University of Nebraska-Lincoln (UNL) History • UNL was chartered in 1869 and is recognized by the Carnegie Foundation as a Doctoral/Research Intensive university (among only top 2% of U.S. institutions). • The University of Nebraska-Lincoln was the first institution in the American West to grant the Ph.D. degree. • In 2011, UNL joined the Big-10 athletic conference and the Big-10 Committee on Institutional Cooperation. • The University of Nebraska-Lincoln is a member of the Fulbright Association. In fact, one of the so honored students graduating this • spring, Mallory Slama, is now teaching English as a foreign language in Bilovec, Czech Republic. Her home town is Tábor, South Dakota. • The University of Nebraska has 3 Nobel Laureates as Alumni

  9. Exceptional Research Programs and Facilities There are 10 Academic Departments in the College of Engineering: • Architectural Engineering • Biological Systems Engineering (houses Agricultural Engineering) • Computer and Electronics Engineering (Omaha) • Computer Science and Engineering • Chemical and BiomolecularEngineering • Civil Engineering (houses Environmental Engineering) • Construction Management • Construction Engineering • Electrical Engineering (houses Electrical, Electronics, Bioengineering, Materials and Optics Engineering) • Mechanical and Materials Engineering

  10. PhD Programs There are 12 PhD programs in the College of Engineering: • Agricultural and Biological Systems Engineering • Architectural Engineering • Biomedical Engineering • Chemical & Biomolecular Engineering • Civil Engineering • Computer Engineering - Computer Science and Engineering (Lincoln) • Computer Engineering - Computer and Electronics Engineering (Omaha) • Construction • Electrical Engineering • Engineering Mechanics • Materials Engineering • Mechanical Engineering

  11. Growing the College of EngineeringAY2012 Y2014 AY2017+ • T/TT Faculty ~160 170 200 • Replacement hires • New hires 10 10 • Cumulative hires ~30 ~100 • Undergraduates 2700 2900 3400 • FTE Graduate Students 360 570 1000

  12. Electrical Engineering Department • 27 Faculty • 14 Professors, 4 Associate Professors, 5 Assistant Professors, 4 Instructors • 4 Companies Started and Owned by Faculty • 1 Member of the National Academy of Engineering • 3 Fellows of the Institute of Electrical and Electronics Engineers (IEEE) • 6 Fellows of various other physical or optical organizations • 2 University Chaired Professors • 4 College Chaired Professors • Numerous Editors and Associate Editors of Journals

  13. Students • 185 Electrical Engineering Undergraduates • Plus 145 Computer Engineering Majors • 45 BSEE degrees granted/year • 20 MS Candidates • 60 PhD Candidates • 12-14 Graduate Degrees granted/year

  14. EE Research Areas For more details go to: http://engineering.unl.edu/academicunits/electricalengineering/

  15. Bioengineering Prof. Khalid Sayood Bioinformatics with application to whole genome phylogeny, and sequence analysis • Data compression with application to Hyperspectral Image Compression, and focal plane compression • Joint Source/Channel Coding Prof. Michael W. Hoffman • Signal Processing Prof. Jerry Varner

  16. Electronics Circuits and Systems Design • Sina Balkir • Prof. John Boye Hamid Vakilzadian

  17. Chip Layout 5.9 mm Camera Chip on a PGA132 package 2.6 mm

  18. On-wafer Characterization

  19. Energy Systems, Power Electronics, and Electric Machines Power Electronics, Controls, Distributed and Smart Power Energy Systems, Power Electronics, and Electric Machines Sohrab Asgarpoor Wei Qiao Dean Patterson Jerry Hudgins Liyan Qu Power Semiconductor Devices and Materials, Packaging, Power Electronics Electric Machines, FEM Analysis, Power Electronics

  20. Decision Making, Manufacturing and Communications • Lance Perez Fred Choobineh • Channel coding and Information theory, • Applications of wireless communications to assistive technology, • Engineering Education.

  21. Mag: 599x, W.D = 14.6mm , Acc.V =7KV • Optics, Photonics, and EM • Mathias Schubert Ming Han John Woollam Ezekiel Bahar

  22. Nanotechnology, Lasers, and Photonics Yongfeng Lu Dennis Alexander Paul Snyder

  23. Mag: 98x, W.D = 10mm, Acc.V = 20KV Materials and Devices • Ned Ianno • Eva Franke-Schubert Rodney Soukup

  24. Current Departmental Information on Graduate Students • Direct PhD option available (after B.S. degree) with high priority of receiving financial aid • Total of 80graduate students in EE • 20 Masters Students • 60 PHD students • 56 have Research Assistantships (48 PhD, 8 MS) • 15 have Teaching Assistantships (12 PhD, 3 MS)

  25. Approximately 170 students have applied to our graduate program for admission since Fall 2011 • 30 were admitted full and unconditionally and 10 were admitted to the Masters program since Fall 2011 • We have admitted Students from the following institutions: • Polytecnicodi Milano, Milan, Italy • Leipzig University, Leipzig, Germany • Bogaziçi University, Istanbul, Turkey • California Institute of Technology (Cal Tech), Pasadena, California, USA • Tsinghua University, Beijing, China • HuazhongUniversity of Science and Technology, Wuhan, China

  26. Research Assistantships (RA): Sponsored by Thesis Advisor • Teaching Assistantships (TA): Sponsored by Department • Fellowships + tuition remission (Part of TA/RA) • Additional merit based fellowships (extra income) • Thesis Dissertation Research Awards, Travel Grants (both domestic and international travel for conference attendance and paper presentation) • Graduate student paper competition • Student who are eligible for assistantships could receive a generous stipend for working, as well as tuition and health insurance benefits • Fast track application for Czech students: Waive application fee, waive GRE Funding/Scholarship Opportunities for PhD Students

  27. Benefits of an assistantship • A new PhD student receives a stipend of $18,000.00 per year (≈ 360,000 CZK) • In addition about $3,100 (≈ 62,000 CZK) is paid each semester for your tuition and • About $500 (≈ 10,000 CZK) is paid for your health insurance each semester. • Thus, each year about $25,000 (≈ 500,000 CZK) are the benefits to you if you have an assistantship. • It is also possible that this could be increased with Fellowships. The fast track application from the last slide is granted to those who receive a recommendation from someone such as me or Drs. Hubička, Olejníček, or Kment.

  28. For a Successful PhD Career • Choosing an Advisor: Mutual relationship with common research interests and responsibilities (for both TAs and RAs). For RAs, advisor is the RA sponsor, whereas for TAs, since the sponsor is the Department, students who obtained a TA have one semester to decide who to work with as an advisor. • Fulfilling the Assistantship requirements: Departmental Teaching Assistantships (TA) may have extra load whereas Research Assistantship (RA) is contingent upon the availability of funds from research grants. PhD students with TAs can have up to 4 years of support with less load initially. • Fulfilling the PhD program credit requirements: Total of 90 (for both TAs and RAs) credit hours with a flexible distribution of research and course work. The balance of research and course work to be determined via Thesis Supervisory Committee.

  29. Keeping the Advisor/Student relation intact: Planning of coursework and research guidance have to be consistently executed throughout the semesters. • Becoming an independent researcher: Expected toward the end of studies. This is evidenced by: • Developing innovative ideas and solutions to the research problem at hand, • Authoring conference and journal papers based on the results of research, • Taking part in graduate student paper competitions, • Making use of Graduate Student Travel Grants to attend International Conferences and present papers, • Participating in authoring research grant proposals • Possibly supervising an M.S. or a senior undergraduate student working in the research lab • Teaching Experience: Opportunities exist for senior PhD students to either teach a class or instruct a lab. This is beneficial if the PhD candidate is targeting an academic career.

  30. Where do our Graduate Students go after graduation? • Manufacturing General Dynamics, Raytheon, Gilroy Foods, Lincoln Composites, ConAgra Foods, Newell-Rubbermaid, Lozier, USAgrium Inc. • Private Industry J.A. Woollam Co., Phillips Research, AFLAC, Mercury Marine • Technology Siemens, Texas Instruments (TI), General Electric, INTEL, Cree Inc., Garmin, WorldCom, IBM, Micron, Lucent Technologies, LSI Logic, ST Micro, Dupont, Omnivision • Consulting Lamp,Rynearsen & Assoc., Black & Veatch, Olsson Assoc., Burns & MacDonnell, HDR • Government • NASA, United States Air Force, Department of Roads, Sandia National Laboratories, Department of Natural Resources • Universities • Stanford University, Georgia Tech, Brown University, Univ. of Georgia, MIT, University of Michigan, Albany State University, Embry-Riddle Aeronautical University, Rice University,

  31. Contact Information: Cheryl Wemhoff Graduate Program Administrator cwemhoff2@unl.edu or Professor Sina Balkir, Graduate Program Director, Dept. of Electrical Engineering, University of Nebraska-Lincoln sbalkir@unl.edu For a direct application, go to https://wam.unl.edu/stuapp/WebAppController?appId=webapp&featureId=grad www.ee.unl.edu Department web site www.unl.edu University web site

  32. Collaborative Research between UNL and the Institute • M. Šícha, L. Bárdoš, M. Tichý, L. Soukup, L. Jastrabík, H. Baránková, R. J. Soukup and J. Touš, "Simple Physical Model of Generation of the Low-Pressure Radio Frequency Supersonic Plasma Jet," Contrib. Plasma Phys. 34, 749-764 (1994). • M. Tichý, M. Šícha, L. Bárdoš, L. Soukup, L. Jastrabík, K. Kapoun, J. Touš, Z. Mazanec and R. J. Soukup, "A Study of the Gas Flow in the RF Low-Pressure Supersonic Jet Plasma Chemical System," Contrib. Plasma Phys. 34, 765-772 (1994). •  L. Soukup, V. Peřina, L. Jastrabík, M. Šícha, P. Pokorný, R. J. Soukup, M. Novák, and J. Zemek, "Germanium Nitride Layers Prepared by Supersonic RF Plasma Jet," Surface and Coatings Technol. 78, 280-283 (1996). • G. Pribil, Z. Hubička, R. J. Soukup, and N. J. Ianno, “Deposition of Electronic Quality Amorphous Silicon, a-Si:H, Thin Films by a Hollow Cathode Plasma-Jet Reactive Sputtering System,” J. Vac. Sci. Technol. A19, 1571-1576 (2001). • Z. Hubička, G. Pribil, R. J. Soukup, and N. J. Ianno, "Investigations of the RF and DC Hollow Cathode Plasma-Jet Sputtering Systems for the Deposition of Amorphous Silicon Thin Films," Surface and Coatings Technol. 160, 114-123 (2002). • R. J. Soukup, N. J. Ianno, G. Pribil and Z. Hubička, “Deposition of High Quality Silicon, Germanium and Silicon-Germanium Thin Films by a Hollow Cathode Reactive Sputtering System,” Surface and Coatings Technol. 177-178, 676-681 (2004). • C. A. Kamler, R. J. Soukup, N. J. Ianno, J. L. Huguenin-Love, J. Olejníček, S. A. Darveau, and C. L. Exstrom, “Thin Films Formed by Selenization of CuInxB1-x Precursors in Se Vapor,” Solar Energy Materials and Solar Cells 93, 45-50 (2009). • R. J. Soukup, N. J. Ianno, J. L. Huguenin-Love, N. T. Lauer, and Z. Hubička, “Deposition of SiC Thin Films using Pulsed Sputtering of a Hollow Cathode,” J. Mater. Sci. Engr. 3, 1 - 7 (2009).

  33.  J. Olejníek, S. A. Darveau, C. L. Exstrom, R. J. Soukup, N. J. Ianno, C. A. Kamler, and J. L. Huguenin-Love, “Problems with Synthesis of Chalcopyrite CuIn1-xBxSe2,” Mat. Sci. Forum 609, 33 -36 (2009). • J. Huguenin-Love, N. T. Lauer, R. J. Soukup, N. J. Ianno, Š Kment, and Z. Hubika, The Deposition of 3C-SiC Thin Films onto the (111) and (110) Faces of Si using Pulsed Sputtering of a Hollow Cathode, Mat. Sci. Forum 245 - 248, 131 -134 (2010). • J. Olejníček, C. A. Kamler, A. Mirasano, A. L. Martinez-Skinner, M. A. Ingersoll, C. L. Exstrom, S. A. Darveau, J. L. Huguenin-Love, M. Diaz, N. J. Ianno, and R. J. Soukup, “A Non-Vacuum Process for Preparing Nanocrystalline CuIn1-xGaxSe2 Materials Involving an open-Air Solvothermal Reaction,” Solar Energy Materials and Solar Cells 94, 8 - 11 (2010). • J. Olejníček, C. A. Kamler, S. A. Darveau, C. L. Exstrom, L. E. Slaymaker, A. R. Vandeventer, N. J. Ianno, and R. J. Soukup, “Formation of CuIn1-xAlxSe2 Thin Films Studied by Raman Scattering,” Thin Solid Films 519, 5329 – 5934 (2011). • J. Olejníček, L. E. Flannery, S. A. Darveau, C. L. Exstrom, Š. Kment, N. J. Ianno and R. J. Soukup, “CuIn1-xAlxS2 Thin Films Prepared by Sulfurization of Metallic Precursors,” J. Alloys Comp. 509, 10020 – 10024 (2011).

  34. Ultra-High Vacuum System

  35. Si and Ge Simultaneous Deposition

  36. A ratio of 1000 at Eg = 1.4 eV is considered excellent

  37. A NOVEL SOL-GEL ROUTE TO PINHOLE-FREE FeS2 THIN FILMS

  38. Auger Analysis of Film, Probably Pure Pyrite

  39. Tauc Plot Yielding Bandgap

  40. More to Come • We are currently working with Drs. Hubička, Olejniček, and Kment to continue the collaboration between the University of Nebraska, Department of Electrical Engineering and the Institute of Physics of the Academy of Sciences of the Czech Republic. Why not join us and become a part of this interesting research?

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