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5 1 volume ratio - PowerPoint PPT Presentation

Process flow with Succinic Acid SpecMat Approval Request

Process flow with Succinic Acid SpecMat Approval Request. July 10, 2009 Saeroonter Oh. Wafer substrate. Cap. 35nm. In 0.53 Ga 0.47 As. n + Si-doped 1e19 cm -3. 10nm. Al 0.48 In 0.52 As. Barrier. n-type Si-doping 5e12 cm -2. Al 0.48 In 0.52 As. 3nm. Channel. 13nm.

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5 1 volume ratio - PowerPoint PPT Presentation

Process flow with Succinic Acid SpecMat Approval Request