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Development of 13.5 nm light source for nanolitography using plasma technologies

Development of 13.5 nm light source for nanolitography using plasma technologies. V. Sergeev, V. Kapralov, A. Kostryukov, I. Miroshnikov Plasma physics chair, Physical Technical Faculty G. Shneerson, Yu. Adamian High voltage techniques chair, Electomechanical Faculty

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Development of 13.5 nm light source for nanolitography using plasma technologies

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  1. Development of 13.5 nm light source for nanolitography using plasma technologies V. Sergeev, V. Kapralov, A. Kostryukov, I. Miroshnikov Plasma physics chair, Physical Technical Faculty G. Shneerson, Yu. Adamian High voltage techniques chair, Electomechanical Faculty State Polytechnical University St. Petersburg

  2. Outline • Motivation • Laser plasma based on solid Xe rod • Laser plasma based on liquid droplet Xe jet • Plasma discharge based on theta-pinch approach • Summary

  3. Motivation Industry requirements for profitable EUV source: • Dimension – <1 mm • Radiation power onto mask in (=13,5 nm, ) range – 130 W Background: • Temperature of Xe plasma – 20-30 eV • Demonstrated power (in 2 st) laser plasma – 2 W • Demonstrated power (in 2 st) Z pinch plasma discharge – 150 W

  4. Z-pinch source for 13.5 nanolitography From V.M. Borisov et al. Plasma physics report (2002) V. 28, No.10 pp.1-5 • Merits: • Small radiation volume • Simplicity relative (to laser scheme) • Problems: • Erosion of electrodes (debris) • Heat removal

  5. -pinch source for 13.5 nanolitography • Merits: • No erosion problem • Smoothed thermal load problem • Problems: • Larger radiation volume (mm range)

  6. Continuous solid Xe rod extruded behind optical system and ignited by pulsed laser Optical system for 13.2 nm lithography developed in Ioffe institute Developed to detect extruded solid H2 rod Light barrier Extruder of solid Xe rod Cryogenic vessel d~1 mm Developed for tokamak plasma fuelling: H2, Kr, Excimer laser Laser synchronization

  7. Uniform droplet generation experiments From Foster et al. Rev. Sci. Instrum., Vol. 48, No. 6, June 1977 100 μm • Liquid Hydrogen droplet generation: • V~100 m/sec; 70 μm droplets at 105/sec or 210 μm droplets at 2×104/sec : • Flow rate: 0.018 cm3/sec • For Xe doplets in EUV source is necessary: • 1μg/pulse×5×103pulse/sec=5×10-3g/sec • 5×10-3g/sec / 3.52 g/cm3=0.0015cm3/sec

  8. Uniform series of liquid Xe droplets ignited by pulsed laser Developed to detect pellet injected into tokamak Light barrier Vibrating nozzle d~1 mm Cryogenic vessel λ≥πdRaleigh instability Developed for tokamak plasma fuelling: H2, Kr, Laser synchronization Excimer laser Optical system for 13.5 nm lithography developed in Ioffe institute

  9. Summary Different ways of EUV source improvement have been considered • Theta-pinch approach has high radiation ower values (size of radiation area? require simulation and experimental verification) • Laser plasma based on solid Xe rod has technical simplicity (require experimental verification of absortion of laser power) • Laser plasma based on liquid droplet Xe jet seems mostly attractive way for development of the EUV source

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