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Fabrication of Grid Mask and Test

Fabrication of Grid Mask and Test. S. H. Kim and J. S. Song Gyeongsang National University Korea. Requirements of fiducial mark Fabrication of sample m ask Test by beam exposure (X-ray & UV) Summary. Requirements of fiducial mark. Mark size : up to 0.1  m  ( grain size)

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Fabrication of Grid Mask and Test

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  1. Fabrication of Grid Mask and Test S. H. Kim and J. S. Song Gyeongsang National University Korea • Requirements of fiducial mark • Fabrication of sample mask • Test by beam exposure (X-ray & UV) • Summary

  2. Requirements of fiducial mark Mark size : up to 0.1 m  (grain size) Gap of each mark : 100 m in a changeable sheet (12.5 ×10 cm2)

  3. Fabrication of samlple mask Size of mask : 15x15cm2 Area of hole marks : 15 x 7.5cm2 (half below) Base : Quartz crystal(3.2mm thick) Coated material : Chrome(10 m thick) Gap distance of each marks : x: 99.6m, x: 99.3 m Hole size : 0.89m 

  4. Exposure byUV beam Mounter Unit : mm

  5. Mask holes Exposed image in X-ray film by ×20 obj. lens by ×20 obj. lens Exposure time : 1 sec UV wave length : 255 nm Distance from source to trget :30cm

  6. Diffractive effect by UV beam Spacer A B B C Hole size: ~4 m Gap distance: ~100 m

  7. Exposed image in the emulsion by ×20 obj. lens by ×50 obj. lens Hole size: ~5 m Gap distance: ~98 m Exposure time : 15 sec UV wave length : 350 nm

  8. Exposure byX-ray beam X-ray beam in GSNU Hospital Energy: 40 kVp(General), 23 kVp(Mamography), 60 kVp (Dental) Target: X-ray film and litho film(Low sensitivity) We could not get hole images!

  9. Summary • We need more test by two beams, especially a few keV X-ray. • In case of UV beam, we have to get best conditions : - beam energy • - exposure time • - need to use parallel beam

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