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π/μID

π/μID. test expose in PSI ( 6/8,2004 ) Tsutomu Fukuda (Nagoya univ). π/μ separation by dE/dX. vertical axis : -dE/dX horizontal axis : Range from lost point (Lead) Red:μ green:π. Good separation. Good separation and number of grains. Good separation 1cm~3cm (Lead). Lead. test.

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π/μID

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  1. π/μID test expose in PSI (6/8,2004) Tsutomu Fukuda (Nagoya univ)

  2. π/μ separation by dE/dX vertical axis :-dE/dX horizontal axis : Range from lost point (Lead) Red:μgreen:π Good separation Good separation and number of grains Good separation 1cm~3cm (Lead) Lead

  3. test • Ⅰ．Tracking pi and mu to their stopping plate in ECC • Ⅱ． The relation between –dE/dX and ph or pv in Low βparticle

  4. Ⅰ． Tracking pi and mu to their stopping plate in ECC Good separation Lost point Stopping point Varify!

  5. Ⅰ． Tracking pi and mu to their stopping plate in ECC ・Expose ① 202MeV/c π ECC (β=0.82) 30particles/cm2 Opera film 2 plates (doublet) Lead 1plates ECC = ×55

  6. Ⅰ． Tracking pi and mu to their stopping plate in ECC ・Expose ② 120MeV/c μ ECC (β=0.75) 30particles/cm2 Opera film 2 plates (doublet) Lead 1plates ECC = ×29

  7. Ⅱ． The relation between –dE/dX and ph or pv in Low βparticle -dE/dX ph , pv in low β particle Good separation pi & mu low βarea

  8. Ⅱ． The relation between –dE/dX and ph or pv in Low βparticle ・Expose ③ 202MeV/c π ECC (β=0.82) 5×103 particles/cm2 Opera film 2 plates (doublet) Lead 2 plates ECC = ×27

  9. Summary • I will do following test exposure. testⅠ： Tracking pi and mu to their stopping plate in ECC test Ⅱ： The relation between –dE/dX and ph or pv in Low βparticle • By data of these test , I expect the precision of pi/mu separation expands.

  10. 完 That’s all

  11. pi mu

  12. Motivation In OPERA,we want to observe ντ appearance. One of the means is the observation of νττπ. The background of this interaction is νμμｃ (low momentum μ). τ ｃ ντ νμ lowπ lowμ ID!! stop! stop!

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