'Feature size' presentation slideshows

Chapter 5: Lithography

Chapter 5: Lithography. Introduction. The mechanism to print 2-D patterns to a thin film layer on the wafer surface. Masks are glass plates (soda lime or quartz glass) that contain the patterns. The patterns are first transferred from the mask to photoresist (PR), a light-sensitive polymer.

1.66k views • 102 slides

Nanoimprint lithography (NIL)

Nanoimprint lithography (NIL). Overview. Thermal NIL resists. Residual layer after NIL. NIL for large features (more difficult than small one). Room temperature NIL, reverse NIL, NIL of bulk resist (polymer sheet, pellets).

800 views • 54 slides

Lecture 1. Technology Trend

COM503 Parallel Computer Architecture & Programming. Lecture 1. Technology Trend. Prof. Taeweon Suh Computer Science Education Korea University. Transistor Basics. Digital chips are designed with transistors Transistor is a three-ported voltage-controlled switch

516 views • 39 slides

Modulation Transfer Function

Modulation Transfer Function. Fraunhofer Diffraction. The measure of the quality of the aerial image is given by The MTF is really a measure of the contrast in the aerial image The optical system needs to produce MTFs of 0.5 or more for a resist to properly resolve the features

810 views • 39 slides

Modulation Transfer Function

Modulation Transfer Function. Fraunhofer Diffraction. The measure of the quality of the aerial image is given by The MTF is really a measure of the contrast in the aerial image The optical system needs to produce MTFs of 0.5 or more for a resist to properly resolve the features

758 views • 39 slides

Tutorial 2

485 views • 38 slides

Lithography

Lithography. Lithography in the MEMS context is typically the transfer of a pattern to a photosensitive material by selective exposure to a radiation source such as light.

965 views • 37 slides

Lithography

Lithography. Lithography in the MEMS context is typically the transfer of a pattern to a photosensitive material by selective exposure to a radiation source such as light.

751 views • 37 slides

Total Dose

Total Dose. Recombination, Transport, and Trapping of Carries. GSFC Total Dose Facility. Example TID Static Bias Board Supports In Situ Testing. MIL-Std-883 Method 1019.5. Annealing allowed for parametric failures; not for functional failures. 1019.5 also allows for low dose rate testing.

619 views • 35 slides

Trends in the Infrastructure of Computing

Trends in the Infrastructure of Computing. CSCE 190: Computing in the Modern World Dr. Jason D. Bakos. My Questions. How do computer processors work? Why do computer processors get faster over time? How much faster do they get? What makes one processor faster than another?

487 views • 35 slides

CSCE 212 Introduction to Computer Architecture

496 views • 31 slides

Chapter 17 - 18

Chapter 17 - 18. Hardwired vs Microprogrammed Control Multithreading Multicore Computers Summary of Parallel Organizations Recap of Course Final Exam: Next Thursday- Same time / same place. Hardwired Control. Hard Wired Control (State machine - Combinational Logic).

439 views • 18 slides

David H. Laidlaw July 17, 2007

341 views • 18 slides

Developing

308 views • 13 slides

Front-end FPGAs in the LHCb upgrade

Front-end FPGAs in the LHCb upgrade. The issues What is known Work plan. Why. The use of FPGA in and near front end boards may help in (thoughts inspired by VELO upgrade considerations): reduce the number of optical links used in the TELL40 boards

222 views • 12 slides

Proximity Effect in EBL by: Zeinab Mohammadi November 2011

Electrical and Computer Engineering Department University of Victoria. Proximity Effect in EBL by: Zeinab Mohammadi November 2011. Outline Definition Origins Avoidance of Proximity Correction.

376 views • 11 slides

Expression array design concepts

190 views • 8 slides

Spacer Lithography

Spacer Lithography. EE C235 Tim Bakhishev. Spacer Process. Pattern [Dummy] Gate. Deposit Conformal SiO 2. SiO2. Dummy. Poly-Si. Si - Substrate. Isotropic Etch of SiO 2. [Remove Dummy Gate]. Feature Size. Advantages of Spacer Process. Feature Size Conformal Deposition

373 views • 7 slides

Ultrafast X-ray Study of Swirling Hollow-Cone Sprays in the Near-Field

Ultrafast X-ray Study of Swirling Hollow-Cone Sprays in the Near-Field. Advanced Photon Source, Argonne National Laboratory, US. Objectives. Ultrafast X-ray Phase-Enhanced Imaging. High Energy X-ray : 9.62keV.

177 views • 1 slides

Quantum Boolean Circuit Construction Methodology Using XOR-AND Reduction Technique

Quantum Boolean Circuit Construction Methodology Using XOR-AND Reduction Technique. Omar Dajani, Prof. Harpreet Singh Department of Electrical & Computer Engineering, Wayne State University. ABSTRACT. (QCA) Structure. Systematic QCA Logic Method.

106 views • 1 slides