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Selective Atomic Layer Deposition of TiO 2 on Silicon/Copper-patterned Substrates

Selective Atomic Layer Deposition of TiO 2 on Silicon/Copper-patterned Substrates. UIC REU 2011 AMReL , University of Illinois at Chicago Abigail Jablansky Department of Chemical and Biomolecular Engineering, University of Pennsylvania. What is ALD?. Atomic layer deposition Method:

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