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Development of MPGDs with resistive foils in JAPAN

Development of MPGDs with resistive foils in JAPAN. Atsuhiko Ochi ( Kobe University ). 5 th RD51 meeting (WG1) 25 May 2009. Background of development. Some Japanese researcher have interested to MPGD with resistive material Problems to start R&D

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Development of MPGDs with resistive foils in JAPAN

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  1. Development of MPGDs with resistive foils in JAPAN Atsuhiko Ochi( Kobe University ) 5thRD51 meeting (WG1) 25 May 2009

  2. Background of development • Some Japanese researcher have interested to MPGD with resistive material • Problems to start R&D • It is difficult to make uniform resistive layer • There are resistive foil in commercial ( on catalogue ), but it is difficult to get it • Strategic items? • CERN got the resistive Kapton from Dupont • R. Oliveira provide me a few tenth sheet of the foil • Last November • I will report the current development status of resistive MPGD (using Rui’sKapton)

  3. Development Items using resistive Kapton • GEM readout with resistive Kapton • KEK ( S.Uno ) • No micro patterning process • GEM with resistive Kapton electrodes • RIKEN (T. Tamagawa) and CNS (S. Hamagaki) • Laser drilling (SciEnergy co. Ltd.) • m-PIC with resistive cathodes • Kobe Univ. (A. Ochi) • Wet etching (Raytech inc.) • These works are activities of MPGD fundamental R&D group in Japan.

  4. GEM readout with resistive material KEK MPGD group

  5. GEM readout in KEK • Inverse signals were found from backstrip • It goes to normal when small surface conductivity attached(by water) • Well controlled surface conductivity was required X,YStrip（Double sided） Strip pitch0.8mm Number of strips120×120 Area96mm×96mm GEM

  6. First trial of resistive coating • Carbon splaying on the readout board • Carbon + plastic + methyl acetate • Thickness : 5mm • Surface resistivity : ~10MW/square • But difficult to control • Efficiency was not uniform GEM Surface Backstrip

  7. Using resistive Kapton • Put the resistive Kapton on double sided readout board • Silicon rubber was used for attachment • There is no micro pattern process on resistive kapton • 2 stage GEM withBoron cathode wasused for neutronimaging

  8. Neutron image and charge distrib. 2420V • HV：2420V, Coincidence fraction : 55% Multiplicity of hit strips

  9. Further trial for using resistive foil • Polyimide with conductive polymer coating • (Kaken Industry co.Ltd) • Surface resistance: ~20MW/□ • HV：2420V, • Coincidencefraction53%

  10. GEM with resistive kapton electrode RIKEN / CNS (Univ. Tokyo) group

  11. Structure of resistive GEM • Processed by Scienergy • Resistive kapton foils are attached on and under LCP sheet using bonding sheet • Holes are drilled by laser • Pitch of the hole : 140mm • Robustness for spark and lower amount of material are expected LCP (50mm) LCP (50mm) Bonding polyimide (35mm) Resistive kapton (25mm)

  12. Setup for testing • GEM area: 3cm x 3cm • Resistivity between both resistive layers : a few TW. • Operation voltage (Vgem) • Up to 1000V when there is no source Drift plane Resistive GEM Readout pad

  13. Signal using 241Am source • Signal using 55Fe will be test soon • These results are very preliminary Vd = 2355V VGEM=330V

  14. m-PIC with resistive cathode Kobe Univ.

  15. Structure of resistive m-PIC E-field will be dropped by spark current. Drift plane -HV • Resistive kapton is on the cathodes of m-PIC. • Large current from spark reduce the e-field, and spark will be quenched. • Huge signal beyond the “Raether limit” will also be suppressed • Signal from low energy deposit will observed with higher gas gain • This design provide one promised possibility of MIP detector under hadronic background 25μm ~1cm Detection area : filled by gas 25μm Cathode Resistive film Resistive sheet Cathode 25mm Anode +HV 100mm Anode 400mm R R R

  16. How to make? • There are two difficulty to use resistive kapton • How to make the fine micro pattern on resistive kapton? • We found how to etching the resistive kapton! (Raytech Inc.) • How to attach the resistive kapton with conductive cathode? • At the first step, Cu foil is electroformed on resistive kapton using spattering • Cathode pattern is processed on the resistive kapton, and attach it on the substrate.

  17. Process for re-mPIC production Supported byraytech-inc．

  18. Process for re-mPIC production Supported byraytech-inc．

  19. Setup for first prototype • Vd = 2kV (2kV/cm) • Vac = 500 – 620V • Gas: Ar+C2H6 • 10cm x 10cm

  20. Signal using 55Fe • 55Fe signals were observed using first prototype! • Estimated gain > 6000 • There is no energy resolution because signal is read from single strip Anode Cathode Va = 500V Va = 520V Va = 540V Va = 560V Va = 620V

  21. Gain curve and pulse destribution • Very preliminary data Pulse destribution (using Ar 90%+ C2H6 10% gas) Vac [V]

  22. Summary • MPGD with resistive kapton R&D has been started in JAPAN • We have started 3 projects using resistive kapton • GEM readout with resistive kapton (KEK) • Charge up is avoided on the substrate, • good 2-dimensional readout • GEM electrode using resistive kapton (RIKEN/CNS) • Success to laser drilling process (SciEnergy co.ltd) • Signal observed using 241Am • m-PIC with resistive cathode (Kobe Univ.) • Success to etching process (Raytech inc.) • Signal observed using 55Fe • We need to improve the production quality, but principle is established • We would like to thank to Rui de Oliveira • For providing material and fruitful discussions

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